The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 15, 2012
Filed:
Dec. 05, 2008
James T. Sims, Vancouver, WA (US);
James T. Sims, Vancouver, WA (US);
CH2M HILL Engineers, Inc., Englewood, CO (US);
Abstract
A system for supplying chlorine to and recovering chlorine from a polysilicon plant may include a brine treatment system, at least one membrane cell, a chlorine drying system, a chlorine compression system, a hydrogen drying system, a hydrogen compression system, a hydrogen chloride synthesis/desorption system, a hydrogen chloride liquefaction system, a liquefied hydrogen chloride storage system, a hydrogen chloride vaporizer, and a waste conversion and filtration system. These systems may be operatively joined to generate hydrogen chloride gas for delivery to the polysilicon plant. A method for supplying chlorine to the polysilicon plant may include generating hydrogen gas and chlorine gas from recovered and raw salt, converting at least a portion of the hydrogen gas and at least a portion of the chlorine gas to hydrogen chloride, passing the hydrogen chloride through a cryogenic column, vaporizing the hydrogen chloride, and providing the vaporized hydrogen chloride to the polysilicon plant.