The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 08, 2012

Filed:

Jul. 17, 2008
Applicants:

Hiroyuki Hoshiya, Kanagawa, JP;

Kenichi Meguro, Kanagawa, JP;

Katsumi Hoshino, Kanagawa, JP;

You Sato, Kanagawa, JP;

Hiroyuki Katada, Kanagawa, JP;

Kazuhiro Nakamoto, Kanagawa, JP;

Inventors:

Hiroyuki Hoshiya, Kanagawa, JP;

Kenichi Meguro, Kanagawa, JP;

Katsumi Hoshino, Kanagawa, JP;

You Sato, Kanagawa, JP;

Hiroyuki Katada, Kanagawa, JP;

Kazuhiro Nakamoto, Kanagawa, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/39 (2006.01);
U.S. Cl.
CPC ...
Abstract

Embodiments of the present invention help to provide a single element type differential magnetoresistive magnetic head capable of achieving high resolution and high manufacturing stability. According to one embodiment, a magnetoresistive layered film is formed by stacking an underlayer film, an antiferromagnetic film, a ferromagnetic pinned layer, a non-magnetic intermediate layer, a soft magnetic free layer, a long distance antiparallel coupling layered film, and a differential soft magnetic free layer. The long distance antiparallel coupling layered film exchange-couples the soft magnetic free layer and the differential soft magnetic free layer in an antiparallel state with a distance of about 3 nanometers through 20 nanometers. By manufacturing the single element type differential magnetoresistive magnetic head using the magnetoresistive layered film, it becomes possible to achieve the high resolution and the high manufacturing stability without spoiling the GMR effect.


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