The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8174670 B1

PDF
Full Text
Expired
Date of Patent:
May. 08, 2012

Filed:

Apr. 07, 2009
Applicants:

Taro Tezuka, Utsunomiya, JP;

Yoshiyuki Kuramoto, Utsunomiya, JP;

Inventors:

Taro Tezuka, Utsunomiya, JP;

Yoshiyuki Kuramoto, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/68 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of measuring an optical characteristic of an optical system using a measurement apparatus, comprises determining a position of each of object points by arranging, on a side of the object plane, an object point measurement device array, and sequentially inserting the object point measurement devices in an optical path, determining a position of each of image points by arranging, on a side of the image plane, an image point measurement device array, and sequentially inserting the image point measurement devices in the optical path, calculating an error attributed to the measurement apparatus based on the positions of object points and the positions of the image points, obtaining a measured value by measurement to obtain information representing the optical characteristic of the optical system using the measurement apparatus, and correcting the measured value based on the error.


Find Patent Forward Citations

Tezuka, Taro. (2012). Measurement method and exposure apparatus (U.S. Patent No. 8174670). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8174670

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