The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 08, 2012

Filed:

Jul. 24, 2009
Applicants:

Bert David Egley, Walnut Creek, CA (US);

August Specht, Walnut Creek, CA (US);

Kenneth Newton, Concord, CA (US);

Dave Deford, Pleasanton, CA (US);

Inventors:

Bert David Egley, Walnut Creek, CA (US);

August Specht, Walnut Creek, CA (US);

Kenneth Newton, Concord, CA (US);

Dave Deford, Pleasanton, CA (US);

Assignee:

Agilent Technologies, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K 1/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

An ion processing apparatus includes a plurality of electrodes, first and second insulators, a housing, and a plurality of compliant first supports and second supports. Each electrode has a length along a central axis, and includes a first end region and an axially opposing second end region. The first and second insulators are coaxially disposed about the first and second end regions, respectively. The housing is coaxially disposed about the electrodes, the first insulator and the second insulator. The first supports extend between, and into contact with, the first insulator and the housing. The second supports extend between, and into contact with, the second insulator and the housing. The supports isolate the electrodes from external forces.


Find Patent Forward Citations

Loading…