The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 08, 2012
Filed:
Oct. 24, 2007
Andre J. Uzee, Baton Rouge, LA (US);
Michael O. Myers, Baton Rouge, LA (US);
Andre J. Uzee, Baton Rouge, LA (US);
Michael O. Myers, Baton Rouge, LA (US);
TSRC (USA) Investment Corporation, Country of New Castle, Wilmington, DE (US);
Abstract
A composition of matter that may be used to make transparent, substantially gel-free polymeric films includes at least a styrenic block copolymer and a thermoplastic resin other than the styrenic block copolymer. The styrenic block copolymer (e.g. S-I-B-S) has four distinct and sequential blocks: a first styrenic block (S), a first diene block (e.g. isoprene or I), a second diene block that differs from the first diene block (e.g. butadiene or B) and a second styrenic block (S). The styrenic block copolymer desirably lacks any random diene block (e.g. a random isoprene/butadiene block). The styrenic block copolymer also desirably lacks any significant percentage of a triblock copolymer (S-I-B). The composition of matter may also include an extender material such as white mineral oil. The compositions may be used to make mono-layer or multi-layer cast or blown films.