The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 08, 2012

Filed:

Dec. 21, 2009
Applicant:

Cristian A. Tivarus, Rochester, NY (US);

Inventor:

Cristian A. Tivarus, Rochester, NY (US);

Assignee:

OmniVision Technologies, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/44 (2006.01); H01L 31/102 (2006.01);
U.S. Cl.
CPC ...
Abstract

A wafer structure for an image sensor includes a substrate that has a given conductivity type, a given dopant concentration, and a given concentration of oxygen. An intermediate epitaxial layer is formed over the substrate. The intermediate epitaxial layer has the same conductivity type and the same, or substantially the same, dopant concentration as the substrate but a lower oxygen concentration than the substrate. A thickness of the intermediate epitaxial layer is greater than the diffusion length of a minority carrier in the intermediate layer. A device epitaxial layer is formed over the intermediate epitaxial layer. The device epitaxial layer has the same conductivity type but lower dopant and oxygen concentrations than the substrate.


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