The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 08, 2012
Filed:
Aug. 11, 2005
Jeffrey T. Koberstein, Storrs, CT (US);
Feng Pan, New York, NY (US);
Kwangjoo Lee, New York, NY (US);
Peng Wang, New York, NY (US);
Jeffrey T. Koberstein, Storrs, CT (US);
Feng Pan, New York, NY (US);
Kwangjoo Lee, New York, NY (US);
Peng Wang, New York, NY (US);
The Trustees of Columbia University in the City of New York, New York, NY (US);
Abstract
A method for surface micropatterning includes forming on a surface containing a first polymer a first coating containing a second polymer having first functionalities capable of being converted to second functionalities by exposure to an acid. A second coating containing a photoacid generator is formed on the first coating. The second coating containing the photoacid generator is selectively irradiated in one or more regions thereof with radiation having a spatially varying internsity pattern to generate an acid in each irradiated region of the second coating. The acid converts the first functionalities of each region of the second polymer underlying a respective irradiated region of the second coating to second functionalities. A first molecular patterned surface having one or more regions of the first functionalities and one or more regions of the second functionalities is formed.