The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 08, 2012
Filed:
Aug. 02, 2006
Soo Young Choi, Fremont, CA (US);
John M. White, Hayward, CA (US);
Beom Soo Park, San Jose, CA (US);
Dong Kil Yim, Sungnam, KR;
Soo Young Choi, Fremont, CA (US);
John M. White, Hayward, CA (US);
Beom Soo Park, San Jose, CA (US);
Dong Kil Yim, Sungnam, KR;
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method of reducing the amount of particulates generated from the surface of a processing component used during plasma enhanced chemical vapor deposition of thin films. The body of the processing component comprises an aluminum alloy, and an exterior surface of said processing component is texturized to increase the amount of surface area present on the exterior surface. The texturizing process includes at least one step in which the surface to be texturized is bead blasted or chemically grained, so that the surface roughness of the texturized surface ranges from about 50 μ-inch Ra to about 1,000 μ-inch Ra.