The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 08, 2012

Filed:

Mar. 10, 2006
Applicants:

Takashi Tatsumi, Kanagawa, JP;

Toshiyuki Yokoi, Tokyo, JP;

Inventors:

Takashi Tatsumi, Kanagawa, JP;

Toshiyuki Yokoi, Tokyo, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C01B 33/021 (2006.01); C01B 33/12 (2006.01);
U.S. Cl.
CPC ...
Abstract

A novel silica which is in the form of ultrafine particles having mesopores and has a regular structure; and a process for producing the silica. The silica is a self-organized nanoparticulate silica characterized in that the average particle diameter is 4 to 30 nm, preferably 6 to 20 nm, and these particles are regularly arranged so as to form a primitive cubic lattice. The self-organized nanoparticulate silica is produced by mixing an alkoxysilane with an aqueous solution of a basic amino acid, reacting the mixture at 40 to 100° C., and subjecting the reaction mixture to drying and preferably to subsequent burning. Also provided is a process for producing fine silica particles having a particle diameter of 4 to 30 nm, which comprises mixing a solution of an alkoxysilane compound having 1 to 4 alkoxy groups with a solution of a basic amino acid and reacting the mixture at 20 to 100° C. to cause hydrolysis and condensation polymerization.


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