The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 01, 2012
Filed:
Mar. 03, 2008
Wolfgang Grünewald, Chemnitz, DE;
Alex Vogt, Buchs, CH;
Alexander Gabathuler, Azmoos, CH;
LEICA MIKROSYSTEME GmbH, Vienna, AT;
Abstract
A probe () for electron microscopy is cut from a solid material. A sample surface () is configured on the same, which is treated with an ion beam (J) at a predetermined angle of incidence such that the material is ablated from the sample surface () by means of etching until the desired observation surface () is exposed on the sample () in the region of the incidence zone () of the ion beam (J), which enables the viewing () of the desired region of the sample () using an electron microscope. For this purpose, at least two stationary ion beams (J, J) are guided onto the sample surface () at a predetermined angle (α) in alignment with each other such that the ion beams (J, J) at least come in contact with each other on the sample surface (), or cross each other, and form an incidence zone () in that location, and that both the sample () and the ion beams (J, J) are not moved, and thus are operated in a stationary manner.