The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 01, 2012

Filed:

Aug. 01, 2005
Applicants:

Kiichiro Oguni, Tochigi, JP;

Kozaburo Hayashi, Tochigi, JP;

Satoshi Yanagida, Tochigi, JP;

Hidetoshi Watanabe, Tokyo, JP;

Naoki Okawa, Tokyo, JP;

Inventors:

Kiichiro Oguni, Tochigi, JP;

Kozaburo Hayashi, Tochigi, JP;

Satoshi Yanagida, Tochigi, JP;

Hidetoshi Watanabe, Tokyo, JP;

Naoki Okawa, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C03C 25/28 (2006.01); C08F 2/46 (2006.01); C08F 220/20 (2006.01); B32B 3/00 (2006.01); G03F 7/028 (2006.01); G03F 7/033 (2006.01);
U.S. Cl.
CPC ...
Abstract

A solvent-free photocurable resin composition is provided which can be applied to the surface of optical discs or the like to form a highly transparent protective film that can stably adhere to the surface and effectively protect the surface from scratches. The solvent-free photocurable resin composition contains a urethane(meth)acrylate oligomer, a trifunctional (meth)acrylic acid ester monomer, a photopolymerization initiator, and a dilution monomer. The dilution monomer contains a fluorine-based (meth)acrylic acid ester monomer having three or more fluorine atoms and a monofunctional or difunctional (meth)acrylic acid ester monomer in amounts of from 10 to 40 wt% and from 10 to 30 wt%, respectively.


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