The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 01, 2012
Filed:
Jun. 18, 2009
Applicants:
Atsunobu Isobayashi, Clifton Park, NY (US);
Yoshihiro Uozumi, Somers, NY (US);
Inventors:
Atsunobu Isobayashi, Clifton Park, NY (US);
Yoshihiro Uozumi, Somers, NY (US);
Assignee:
Kabushiki Kaisha Toshiba, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/768 (2006.01);
U.S. Cl.
CPC ...
Abstract
Methods of making interconnect structures are provided. In one aspect of the innovation, when forming a trench or via in a dielectric layer, the sidewall surface of another via and/or trench is covered with a metal oxide layer. The metal oxide layer can prevent and/or mitigate surface erosion of the sidewall surface. As a result, the methods can improve the controllability of critical dimensions of the via and trench.