The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 01, 2012

Filed:

Jul. 20, 2009
Applicants:

Tomohito Ozawa, Mishima, JP;

Kazuyoshi Akiyama, Mishima, JP;

Yuu Nishimura, Suntou-gun, JP;

Inventors:

Tomohito Ozawa, Mishima, JP;

Kazuyoshi Akiyama, Mishima, JP;

Yuu Nishimura, Suntou-gun, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03G 5/147 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention provides a method for manufacturing an electrophotographic photosensitive member including a step of forming a first surface layer and a second surface layer of the electrophotographic photosensitive member by supplying a source gas into a reaction vessel so that C/S, which are respectively flow rates of CHand SiHflowing when the second surface layer is formed, can be 3 or more and 25 or less, and C/S, which are respectively flow rates of CHand SiHflowing when the first surface layer is formed, can be C/Sor more but 60 or less. The method includes an additional step of adjusting the high-frequency power so that P>Pcan be satisfied, which are high-frequency powers respectively when the second surface layer is formed and when the first surface layer is formed, and C/(Si+C) of the first surface layer and C/(Si+C) of the second surface layer can be 0.50 or more and 0.80 or less.


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