The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 01, 2012

Filed:

Jul. 29, 2008
Applicants:

Mamoru Morikawa, Joetsu, JP;

Daijitsu Harada, Joetsu, JP;

Masaki Takeuchi, Joetsu, JP;

Inventors:

Mamoru Morikawa, Joetsu, JP;

Daijitsu Harada, Joetsu, JP;

Masaki Takeuchi, Joetsu, JP;

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B65D 81/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A storage container for containing a photomask-forming synthetic quartz glass substrate comprises inner walls facing the front and back surfaces of the glass substrate, and reservoirs provided on the container inner walls for receiving an absorber for components outgassing from the container. A ratio A/B is in the range of 1.0-120 m/cmprovided that A is the product (m) of the total weight (g) of the absorber multiplied by the BET specific surface area (m/g) of the absorber and B is the total area (cm) of the front and back surfaces of the glass substrate.


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Morikawa, Mamoru. (2012). Storage container for photomask-forming synthetic quartz glass substrate (U.S. Patent No. 8168272). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8168272

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