The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 01, 2012

Filed:

Sep. 17, 2008
Applicants:

Rong Liu, Selden, NY (US);

Vladimir Gurevich, Stony Brook, NY (US);

Ming Yu, Hoffman Estates, IL (US);

Inventors:

Rong Liu, Selden, NY (US);

Vladimir Gurevich, Stony Brook, NY (US);

Ming Yu, Hoffman Estates, IL (US);

Assignee:

Symbol Technologies, Inc., Holtsville, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method and apparatus for improving the image quality obtained by an imaging-based scanner comprising a housing supporting one or more protective windows. The apparatus further comprises at least one scanning arrangement, the scanning arrangement comprising illumination and imaging optics. The illumination and imaging optics form a respective field of view for imaging a target object. A light baffle is attached to the scanning arrangement. The light baffle has an aperture corresponding to each of the illumination and imaging optics such that stray light reflected from the protective windows is absorbed by the light baffle, improving the image quality of the imaging-based scanner.


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