The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 01, 2012

Filed:

Jan. 05, 2006
Applicants:

Sang-jin Han, Kyunggi-do, KR;

Kwan-seop Song, Kyunggi-do, KR;

Hee-cheol Kang, Kyunggi-do, KR;

Seok-heon Jeong, Kyunggi-do, KR;

Inventors:

Sang-Jin Han, Kyunggi-do, KR;

Kwan-Seop Song, Kyunggi-do, KR;

Hee-Cheol Kang, Kyunggi-do, KR;

Seok-Heon Jeong, Kyunggi-do, KR;

Assignee:

Samsung Mobile Display Co., Ltd., Giheung-Gu, Yongin, Gyunggi-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/68 (2006.01);
U.S. Cl.
CPC ...
Abstract

Disclosed are a holding tray, a substrate alignment system using the same and a method thereof. More specifically, the present invention relates to a holding tray for substrate capable of accomplishing high-precision alignment and conducting a stable deposition. A holding means is included in at least one side of the substrate to hold and support the substrate in a manner that the substrate is vertically held and supported on a flat surface of the holding tray during a vacuum process. The holding tray according to the present invention, the substrate alignment system using the same, and the method thereof include a substrate on which a deposition is made, a frame formed to receive the substrate, a tray formed to receive the frame, and at least one holding means formed to hold the substrate on the frame. The holding tray for substrate according to the present invention, the substrate alignment system using the same, and the method thereof are useful to accomplish high-precision alignment and conduct a stable deposition process due to the stable vertical arrangement of the substrate during the deposition process.


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