The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 01, 2012
Filed:
Mar. 25, 2009
Mitsuru Nagai, Tokyo, JP;
Nobuo Ando, Tokyo, JP;
Takashi Utsunomiya, Tokyo, JP;
Yutaka Sato, Tokyo, JP;
Ken Baba, Tokyo, JP;
Mitsuru Nagai, Tokyo, JP;
Nobuo Ando, Tokyo, JP;
Takashi Utsunomiya, Tokyo, JP;
Yutaka Sato, Tokyo, JP;
Ken Baba, Tokyo, JP;
Fuji Jukogyo Kabushiki Kaisha, Tokyo, JP;
Abstract
In a current collector laminating step, a current-collector laminate unitcomposed of current-collector materialsandand a film materialis formed. Resist layershaving a predetermined pattern are formed on both surfaces of the current-collector laminate unit. An etching process is performed with the resist layersused as a mask, whereby through-holesandare formed on the respective current-collector materialsand. The resist layersare removed from the current-collector laminate unit. Since the etching process is performed on the plural current-collector materialsand, productivity of an electrode can be enhanced. During the application of the slurry, the film materialprevents the leakage of the electrode slurry. Therefore, the current-collector laminate unitcan be conveyed in the horizontal direction, whereby the productivity of the electrode can be enhanced.