The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 24, 2012

Filed:

Nov. 01, 2006
Applicants:

Kim L. Tan, Santa Rosa, CA (US);

Karen D. Hendrix, Santa Rosa, CA (US);

Charles A. Hulse, Sebastopol, CA (US);

Curtis R. Hruska, Windsor, CA (US);

Inventors:

Kim L. Tan, Santa Rosa, CA (US);

Karen D. Hendrix, Santa Rosa, CA (US);

Charles A. Hulse, Sebastopol, CA (US);

Curtis R. Hruska, Windsor, CA (US);

Assignee:

Other;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02F 1/1335 (2006.01);
U.S. Cl.
CPC ...
Abstract

A grating trim retarder fabricated from a form-birefringent multi-layer dielectric stack including at least one anti-reflection coating and supported on a transparent substrate is provided. The form-birefringent dielectric stack includes an axially-inhomogeneous element in the form of a −C-plate grating and a transversely-inhomogeneous element in the form of an A-plate grating. Each of the −C-plate and the A-plate gratings are fabricated with dimensions to form a zeroth order sub-wavelength grating structure. Fabricating the grating trim retarder with anti-reflection coatings and/or a segment where the −C-plate and A-plate grating overlap enables the in-plane and out-of-plane retardances to be tailored independently according to the desired application.


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