The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 24, 2012

Filed:

Feb. 28, 2008
Applicants:

Masuyuki Sugiyama, Hachioji, JP;

Yuichiro Hashimoto, Tachikawa, JP;

Hideki Hasegawa, Tachikawa, JP;

Yasuaki Takada, Kiyose, JP;

Inventors:

Masuyuki Sugiyama, Hachioji, JP;

Yuichiro Hashimoto, Tachikawa, JP;

Hideki Hasegawa, Tachikawa, JP;

Yasuaki Takada, Kiyose, JP;

Assignee:

Hitachi, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 59/44 (2006.01);
U.S. Cl.
CPC ...
Abstract

There has been a problem that both detection sensitivity and throughput cannot be improved simultaneously by a conventional MS/MS analysis method. A mass analyzer having an ion trap for ejecting ions in a specific mass range, a collisional dissociation part for causing ions ejected from the ion trap to be dissociated, a mass analyzing part for performing a mass analysis of ions ejected from the collisional dissociation part, and a control part including a list in which measurement conditions for each ion are stored selectively resonance-ejects ions introduced into and accumulated in the ion trap based on masses. A scanning operation is a repetition of an operation of ejecting specific precursor ions in a direction of the collisional dissociation part and an operation of ejecting nothing, and each ion can be measured under optimal measurement conditions by controlling an output voltage of each part with reference to list information, realizing a mass analyzer that can perform an MS/MS measurement with high throughput and high sensitivity.


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