The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 24, 2012
Filed:
Sep. 12, 2007
Hiroshi Ozawa, Tsukuba, JP;
Tomiaki Otake, Chiyoda-ku, JP;
Hiroshi Ozawa, Tsukuba, JP;
Tomiaki Otake, Chiyoda-ku, JP;
Kuraray Co., Ltd., Kurashiki-shi, JP;
Abstract
A methacrylic resin composition in which a star block copolymer (B) in the form of particles is dispersed in a matrix (A) composed of a methacrylic resin comprising not less than 50% by mass of a methyl methacrylate unit. The methacrylic resin composition is obtained by bulk-polymerizing or solution-polymerizing 100 parts by mass of a monomer mixture (A') containing 50 to 100% by mass of methyl methacrylate and 0 to 50% by mass of other vinyl monomer copolymerizable with the methyl methacrylate, in the presence of 1 to 80 parts by mass of the star block copolymer (B) comprising a polymer block (a) composed of a (meth)acrylic acid alkyl ester unit and a polymer block (b) composed of a conjugated diene compound unit, until the polymerization conversion of the monomer reaches 70% by mass or more.