The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 24, 2012

Filed:

Jun. 04, 2009
Applicants:

Hiroyuki Abo, Tokyo, JP;

Masaki Ohsumi, Yokosuka, JP;

Toshiyasu Sakai, Kawasaki, JP;

Noriyasu Ozaki, Atsugi, JP;

Mitsuru Chida, Yokohama, JP;

Kazuya Abe, Tokyo, JP;

Inventors:

Hiroyuki Abo, Tokyo, JP;

Masaki Ohsumi, Yokosuka, JP;

Toshiyasu Sakai, Kawasaki, JP;

Noriyasu Ozaki, Atsugi, JP;

Mitsuru Chida, Yokohama, JP;

Kazuya Abe, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B41J 2/05 (2006.01);
U.S. Cl.
CPC ...
Abstract

Provided is a process of producing a liquid discharge head having a substrate, a passage-forming member, and a patterned layer. The process includes providing a resin layer on a substrate; providing a resist pattern on the resin layer for patterning the resin layer; forming a patterned layer by patterning the resin layer using the resist pattern as a mask; providing a layer for forming a passage pattern having a shape of passage on the resist pattern lying on the patterned layer; forming a passage pattern by patterning the layer for forming a passage pattern; removing the resist pattern; providing a passage-forming member so as to cover the passage pattern and the patterned layer; and removing the passage pattern to give the passage.


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