The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 24, 2012
Filed:
Mar. 31, 2008
Hai Sun, Milpitas, CA (US);
Liubo Hong, San Jose, CA (US);
Rowena Schmidt, Gilroy, CA (US);
Lijie Zhao, Pleasanton, CA (US);
Winnie Yu, San Jose, CA (US);
Hongping Yuan, Fremont, CA (US);
Hai Sun, Milpitas, CA (US);
Liubo Hong, San Jose, CA (US);
Rowena Schmidt, Gilroy, CA (US);
Lijie Zhao, Pleasanton, CA (US);
Winnie Yu, San Jose, CA (US);
Hongping Yuan, Fremont, CA (US);
Western Digital (Fremont), LLC, Fremont, CA (US);
Abstract
A method of lifting off photoresist beneath an overlayer includes providing a structure including photoresist and depositing an overlayer impenetrable to a liftoff solution over the photoresist and a field region around the structure. The method also includes forming a mask over the structure and ion milling to remove the overlayer in the field region not covered by the mask. The method then includes lifting off the photoresist using the liftoff solution.