The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 24, 2012
Filed:
Aug. 17, 2005
Markus K. Tilsch, Santa Rosa, CA (US);
Richard I. Seddon, Santa Rosa, CA (US);
Georg J. Ockenfuss, Santa Rosa, CA (US);
Jeremy Hayes, Santa Rosa, CA (US);
Robert E. Klinger, Rohnert Park, CA (US);
Markus K. Tilsch, Santa Rosa, CA (US);
Richard I. Seddon, Santa Rosa, CA (US);
Georg J. Ockenfuss, Santa Rosa, CA (US);
Jeremy Hayes, Santa Rosa, CA (US);
Robert E. Klinger, Rohnert Park, CA (US);
Other;
Abstract
The present invention relates to a magnetron sputtering device and technique for depositing materials onto a substrate at a high production rate in which the deposited films have predictive thickness distribution and in which the apparatus can operate continuously and repeatedly for very long periods. The present invention has realized increased production by reducing cycle time. Increased coating rates are achieved by coupling a planetary drive system with a large cathode. The cathode diameter is greater than the diameter of a planet and less than twice the diameter of the planet. Lower defect rates are obtained through the lower power density at the cathode which suppresses arcing, while runoff is minimized by the cathode to planet geometry without the use of a mask.