The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 24, 2012
Filed:
May. 09, 2008
Atsushi Kikugawa, Osaka, JP;
Koshi Yoshimura, Osaka, JP;
Yoshimi Tochishita, Hyogo, JP;
Masanao Kamachi, Saitama, JP;
Nobuhiro Misumi, Hyogo, JP;
Atsushi Kikugawa, Osaka, JP;
Koshi Yoshimura, Osaka, JP;
Yoshimi Tochishita, Hyogo, JP;
Masanao Kamachi, Saitama, JP;
Nobuhiro Misumi, Hyogo, JP;
Hitachi Metals, Ltd., Tokyo, JP;
Abstract
An R—Fe—B sinlered magnet having on the surface thereof a vapor deposited film of aluminum or an alloy thereof and a method for producing the same. The vapor deposited film of aluminum or an alloy thereof comprises a columnar crystalline structure grown broader from the surface of the R—Fe—B sintered magnet body outward to the outer surface, which has a part within a region defined in the thickness direction of the film as taken from the surface of the R—Fe—B sintered magnet to ⅓ of the film thickness, 5 to 30 intercrystalline gaps of 0.01 μm to 1 μm in width as counted per 10 μm length in the lateral direction of the film. The method comprises controlling the average film formation rate such that it is slower up to a predetermined point and then is speeded up later thereon.