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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8163049 B1

PDFFull Text
Expired
Date of Patent:
Apr. 24, 2012

Filed:

Apr. 06, 2007

Fluoride-modified silica sols for chemical mechanical planarization

Applicant:

Junaid Ahmed Siddiqui, Richmond, VA (US);

Inventor:

Junaid Ahmed Siddiqui, Richmond, VA (US);

Assignee:

DuPont Air Products Nanomaterials LLC, Tempe, AZ (US);

Attorneys:

Christopher Hayden

John R. Dodd

Geoffrey L. Chase

Primary Examiner:

Jerry Lorengo

Assistant Examiner:

Ross J Christie

Int. Cl.
CPC ...
B24D 3/02 (2006.01); C09C 1/68 (2006.01); C09K 3/14 (2006.01);
U.S. Cl.
CPC ...
Abstract

A chemical-mechanical planarization composition containing surface-modified abrasive particles such as silica where at least a portion of the surface of the particles has bound thereto a surface-modifying aluminum-containing stabilizer and fluoride that is used to polish semiconductor substrates. The use of a CMP slurry containing surface-modifying aluminum-containing stabilizer and fluoride bound to a silica abrasive provides high metal polishing rates relative to the removal rate of a dielectric.

Find Patent Forward Citations

Siddiqui, Junaid. (2012). Fluoride-modified silica sols for chemical mechanical planarization (U.S. Patent No. 8163049). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8163049

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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