The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 24, 2012
Filed:
Oct. 10, 2005
Applicants:
Thomas J. Moran, Radolfzell-Stahringen, DE;
Lutz Rebstock, Gaienhofen, DE;
Inventors:
Thomas J. Moran, Radolfzell-Stahringen, DE;
Lutz Rebstock, Gaienhofen, DE;
Assignee:
Dynamic Microsystems Semiconductor Equipment GmbH, Radolfzell, DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B08B 3/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
An apparatus and a method serve for cleaning articles used in the production of semiconductors, such as wafers, containers for transporting wafers (known as FOUPs), LCD substrates and photomasks. The articles are cleaned in a treatment chamber by means of a liquid and subsequently dried. A drying gas, such as air, is circulated within the treatment chamber and a condensation dryer is provided for extracting moisture from the gas.