The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 17, 2012

Filed:

Oct. 20, 2010
Applicants:

Alex A. Behfar, Ithaca, NY (US);

Kiyofumi Muro, Chiba, JP;

Cristian B. Stagarescu, Ithaca, NY (US);

Alfred T. Schremer, Freeville, NY (US);

Inventors:

Alex A. Behfar, Ithaca, NY (US);

Kiyofumi Muro, Chiba, JP;

Cristian B. Stagarescu, Ithaca, NY (US);

Alfred T. Schremer, Freeville, NY (US);

Assignee:

BinOptics Corporation, Ithaca, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01S 3/03 (2006.01);
U.S. Cl.
CPC ...
Abstract

A single-mode, etched facet distributed Bragg reflector laser includes an AlGaInAs/InP laser cavity, a front mirror stack with multiple Fabry-Perot elements, a rear DBR reflector, and a rear detector. The front mirror stack elements and the rear reflector elements include input and output etched facets, and the laser cavity is an etched ridge cavity, all formed from an epitaxial wafer by a two-step lithography and CAIBE process.


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