The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2012
Filed:
Oct. 11, 2011
Fang Huang, Fremont, CA (US);
Fang Huang, Fremont, CA (US);
NovaSolar Holdings Limited, Tortola, VG;
Abstract
A treatment pattern (such as a focused spot, an image, or an interferogram) projected on a treatment target may lose precision if the treatment beam must pass through a birefringent layer before reaching the target. In the general case, the birefringent layer splits the treatment beam into ordinary and extraordinary components, which propagate in different directions and form two patterns, displaced from each other, at the target layer. The degree of birefringence and the orientation of the optic axis, which influence the amount of displacement, often vary between workpieces or between loci on the same workpiece. This invention measures the orientation of the optic axis and uses the data to adjust the treatment beam incidence direction, the treatment beam polarization, or both to superpose the ordinary and extraordinary components into a single treatment pattern at the target, preventing the birefringent layer from causing the pattern to be blurred or doubled.