The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 17, 2012

Filed:

Nov. 03, 2006
Applicants:

Wei-kai Huang, Hsinchu, TW;

Ying-tsang Liu, Hsinchu, TW;

Chen-shun Tsai, Hsinchu, TW;

Jeng-shin Chen, Hsinchu, TW;

Yu-chieh Lin, Hsinchu, TW;

Inventors:

Wei-Kai Huang, Hsinchu, TW;

Ying-Tsang Liu, Hsinchu, TW;

Chen-Shun Tsai, Hsinchu, TW;

Jeng-Shin Chen, Hsinchu, TW;

Yu-Chieh Lin, Hsinchu, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/1343 (2006.01); G02F 1/136 (2006.01); G02F 1/1337 (2006.01);
U.S. Cl.
CPC ...
Abstract

An active matrix substrate including a substrate, a plurality of scan lines, a plurality of data lines, a plurality of independent common line patterns, and a plurality of pixels is provided. The scan lines, data lines, and common line patterns are disposed on the substrate. The pixels are arranged in array on the substrate, wherein each pixel is electrically connected to corresponding scan line and data line, and the common line patterns are distributed under each pixel. Each pixel includes a plurality of active components and a plurality of pixel electrodes. Each of the pixel electrodes is electrically connected to corresponding scan line and data line through different active components. The capacitance coupling effect between each of the pixel electrodes and common line patterns are different. Additionally, an inspection method for the active matrix substrate and a liquid crystal display having the active matrix substrate are further provided.


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