The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2012
Filed:
Sep. 12, 2007
Waltraud Werdecker, Hanau, DE;
Norbert Traeger, Maintal, DE;
Juergen Weber, Kleinostheim, DE;
Heraeus Quarzglas GmbH & Co. KG, Hanau, DE;
Abstract
A known SiOslurry for the production of quartz glass contains a dispersion liquid and amorphous SiOparticles with particle sizes to a maximum of 500 μm, wherein the largest volume fraction is composed of SiOparticles with particle sizes in the range 1 μm-60 μm, as well as SiOnanoparticles with particle sizes less than 100 nm in the range 0.2-15% volume by weight (of the entire solids content). In order to prepare such a slurry for use, and to optimize the flow behavior of such a slurry with regard to later processing by dressing or pouring the slurry mass, and with regard to later drying and sintering without cracks, the invention suggests a slurry with SiOparticles with a multimodal distribution of particle sizes, with a first maximum of the sizes distribution in the range 1 μm-3 μm and a second maximum in the range 5 μm-50 μm, and a solids content (percentage by weight of the SiOparticles and the SiOnanoparticles together) in the range 83%-90%.