The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2012
Filed:
May. 26, 2010
Toshio Sakurai, Fukuyama, JP;
Takayuki Takahagi, Higashi-Hiroshima, JP;
Hiroyuki Sakaue, Higashi-Hiroshima, JP;
Shoso Shingubara, Higashi-Hiroshima, JP;
Hiroyuki Tomimoto, Tsukuba, JP;
Toshio Sakurai, Fukuyama, JP;
Takayuki Takahagi, Higashi-Hiroshima, JP;
Hiroyuki Sakaue, Higashi-Hiroshima, JP;
Shoso Shingubara, Higashi-Hiroshima, JP;
Hiroyuki Tomimoto, Tsukuba, JP;
Rorze Corporation, Hiroshima, JP;
Abstract
While a fine porous diamond particle film has been known as a high heat resistant and low dielectric constant film and also has high mechanical strength and heat conductivity, and is expected as an insulating film for multi-layered wirings in semiconductor integrated circuit devices, it is insufficient in current-voltage characteristic and has not yet been put into practical use. According to the invention, by treating the fine porous diamond particle film with an aqueous solution of a salt of a metal such as barium and calcium, the carbonate or sulfate of which is insoluble or less soluble, and a hydrophobic agent such as hexamethyl disilazane or trimethyl monochlolo silane, as well as a reinforcing agent containing one of dichlorotetramethyl disiloxane or dimethoxytetramethyl disiloxane, thereby capable of putting the dielectric breakdown voltage and the leak current within a specified range of a practical standard.