The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 17, 2012

Filed:

Oct. 18, 2007
Applicants:

Moses M. David, Woodbury, MN (US);

Steven J. Martin, Shoreview, MN (US);

Rudolf J. Dams, Antwerp, BE;

Wayne W. Fan, Cottage Grove, MN (US);

Inventors:

Moses M. David, Woodbury, MN (US);

Steven J. Martin, Shoreview, MN (US);

Rudolf J. Dams, Antwerp, BE;

Wayne W. Fan, Cottage Grove, MN (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 9/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of forming an easy-to-clean metal or metallized substrate, the method comprising forming a layer comprising silicon, oxygen, and hydrogen on at least a portion of a surface of the substrate by plasma deposition; and applying an at least partially fluorinated composition comprising at least one silane group to at least a portion of a surface of the layer comprising the silicon, oxygen, and hydrogen; and an easy-to-clean article made by the method are disclosed.


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