The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2012
Filed:
Aug. 30, 2007
Applicants:
Kenya Ohashi, Hitachinaka, JP;
Masahiko Ogino, Hitachi, JP;
Akihiro Miyauchi, Hitachi, JP;
Inventors:
Assignee:
Hitachi Industrial Equipment Systems Co., Ltd., Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C 59/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A mold for forming a resin pattern using nanoimprint lithography according to the present invention comprises a main mold including a fine pattern of a protrusion and a depression intended to be transferred, and a spacer for forming a space between the protrusion of the fine pattern of the main mold and a transferred object during a transfer of the fine pattern, in which the spacer has a vent passage capable of flowing gas therethrough and has an elasticity against a pressing force during the transfer.