The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 10, 2012
Filed:
Mar. 30, 2004
L. Gregory Meredith, Seattle, WA (US);
Allen L. Brown, Jr., Bellevue, WA (US);
David Richter, Seattle, WA (US);
George Moore, Issaquah, WA (US);
L. Gregory Meredith, Seattle, WA (US);
Allen L. Brown, Jr., Bellevue, WA (US);
David Richter, Seattle, WA (US);
George Moore, Issaquah, WA (US);
Microsoft Corporation, Redmond, WA (US);
Abstract
A reflective process algebra called the ρ-calculus facilitates the serialization of processes at the level of the reflective process algebra. The reflective process algebra because of its reflective properties, can be used on computing systems with finite resources. The reflective process calculus can be made to be sensitive to resources, such as memory and bandwidth, hence facilitating its use as a programming language at the machine level. The reflective process calculus causes the dual nature of a computation entity to be exposed. A name can be caused to become a process and a process can be caused to become a name.