The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 10, 2012
Filed:
Feb. 20, 2008
Mathieu Pernot, Paris, FR;
Mathias Fink, Meudon, FR;
Mickaël Tanter, Bagneux, FR;
Gabriel Montaldo, Paris, FR;
Jean-francois Aubry, Bourg la Reine, FR;
Ralph Sinkus, Paris, FR;
Mathieu Pernot, Paris, FR;
Mathias Fink, Meudon, FR;
Mickaël Tanter, Bagneux, FR;
Gabriel Montaldo, Paris, FR;
Jean-Francois Aubry, Bourg la Reine, FR;
Ralph Sinkus, Paris, FR;
Super Sonic Imagine, Paris, FR;
Abstract
The invention concerns a method for optimizing the focusing of waves in a zone of interest of a medium, with the waves being emitted by a network of sources to the medium through an aberration-inducing element that introduces an initially indeterminate phase shift. The method according to the invention proposes to use M−1 successive modifications of the emitted wave, each giving rise to a perturbation. According to the invention, the M perturbations are measured in the zone of interest at each modification of the phase and/or amplitude distributions, and these measurements are used to deduce optimal focusing characteristics to maximize the perturbation induced in the zone of interest.