The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 10, 2012
Filed:
Jul. 10, 2009
Yoshihiro Tsuchiya, Tokyo, JP;
Shinji Hara, Tokyo, JP;
Kiyoshi Noguchi, Tokyo, JP;
Migaku Takahashi, Miyagi, JP;
Masakiyo Tsunoda, Miyagi, JP;
Yoshihiro Tsuchiya, Tokyo, JP;
Shinji Hara, Tokyo, JP;
Kiyoshi Noguchi, Tokyo, JP;
Migaku Takahashi, Miyagi, JP;
Masakiyo Tsunoda, Miyagi, JP;
TDK Corporation, Tokyo, JP;
Abstract
An MR element in a CPP structure includes a spacer layer made of Cu, a magnetic pinned layer containing CoFe and a free layer containing CoFe that are laminated to sandwich the spacer layer. The free layer is located below the magnetic pinned layer. The free layer is oriented in a (001) crystal plane, the spacer layer is formed and oriented in a (001) crystal plane on the (001) crystal plane of the free layer. Therefore, in a low resistance area where an area resistivity (AR) of the MR element is, for example, lower than 0.3 Ω·μm, an MR element that has a large variation of a resistance is obtained.