The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 10, 2012
Filed:
Dec. 30, 2010
Jae-seon Yu, Gyeonggi-do, KR;
Jae-Seon Yu, Gyeonggi-do, KR;
Hynix Semiconductor Inc., Gyeonggi-do, KR;
Abstract
A method for fabricating a semiconductor device includes depositing and stacking a hard mask layer and a sacrificial layer over an etch target layer forming a mask pattern with holes defined therein over the sacrificial layer, forming first pillars filling the holes; removing the mask pattern, forming second pillars by using the first pillars as an etch barrier and etching the sacrificial layer, forming spacers surrounding sidewalls of each second pillar, removing the second pillars, etching the hard mask layer by using the spacers as etch barriers to form a hard mask pattern, and forming a hole pattern by using the hard mask pattern as an etch barrier and etching the etch target layer.