Methods and compositions for electrophoretic metallization deposition

Abstract

Embodiments of the invention generally provide methods and compositions that are used during electrophoretic deposition (EPD) processes. In one embodiment, a method for forming a metallization material during an EPD process is provided which includes positioning a substrate containing apertures disposed thereon, exposing the substrate to a flux agent to form a flux coating within the apertures, exposing the flux coating to an EPD mixture to form a particulate layer therein, and exposing the substrate to a reflow process to form a metallization layer within the apertures. Optionally, the particulate layer may be exposed to the flux agent prior to the reflow process. The EPD mixture generally contains a dielectric hydrocarbon fluid, metallic particles, and a liquid crystal material (LCM), such as a cholesteryl compound. In some embodiments, an abietic acid compound may be used as the flux agent, or alternatively, as the LCM.