The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 03, 2012

Filed:

Feb. 24, 2010
Applicants:

Teruo Sasagawa, Los Gatos, CA (US);

Clarence Chui, San Jose, CA (US);

Manish Kothari, Cupertino, CA (US);

Suryaprakash Ganti, Los Altos, CA (US);

Jeffrey B. Sampsell, Pueblo West, CO (US);

Chun-ming Wang, Fremont, CA (US);

Inventors:

Teruo Sasagawa, Los Gatos, CA (US);

Clarence Chui, San Jose, CA (US);

Manish Kothari, Cupertino, CA (US);

SuryaPrakash Ganti, Los Altos, CA (US);

Jeffrey B. Sampsell, Pueblo West, CO (US);

Chun-Ming Wang, Fremont, CA (US);

Assignee:

Qualcomm Mems Technologies, Inc., San Diego, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 26/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A microelectromechanical systems device having support structures formed of sacrificial material surrounded by a protective material. The microelectromechanical systems device includes a substrate having an electrode formed thereon. Another electrode is separated from the first electrode by a cavity and forms a movable layer, which is supported by support structures formed of a sacrificial material.


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