The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 03, 2012

Filed:

Apr. 23, 2008
Applicants:

Hideki Morishima, Utsunomiya, JP;

Takahiro Sasaki, Hiroshima, JP;

Hiromitsu Takase, Utsunomiya, JP;

Inventors:

Hideki Morishima, Utsunomiya, JP;

Takahiro Sasaki, Hiroshima, JP;

Hiromitsu Takase, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 27/52 (2006.01); G03B 27/54 (2006.01); G03B 27/42 (2006.01); G03B 27/32 (2006.01);
U.S. Cl.
CPC ...
Abstract

A cleaning apparatus for an exposure apparatus that projects a pattern of an exposing mask onto a substrate with first light through an optical element is provided. The cleaning apparatus cleans the optical element with second light having a wavelength different from that of the first light, and includes a recording part configured to record information on exposure history of the exposure apparatus, and an information producing part configured to produce information on a cumulative irradiation light amount of the second light at each of regions in a predetermined cleaning area on the optical element, based on the information on the exposure history.


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