The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 03, 2012

Filed:

Mar. 04, 2005
Applicants:

Martin A. Paonessa, Niagara Falls, NY (US);

Rajiv R Singh, Getzville, NY (US);

Valentine T Zuba, Orchard Park, NY (US);

George a Shia, Amherst, NY (US);

John a Mcfarland, Scottsdale, AZ (US);

Inventors:

Martin A. Paonessa, Niagara Falls, NY (US);

Rajiv R Singh, Getzville, NY (US);

Valentine T Zuba, Orchard Park, NY (US);

George A Shia, Amherst, NY (US);

John A McFarland, Scottsdale, AZ (US);

Assignee:

Honeywell International Inc., Morristown, NJ (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C07D 211/00 (2006.01); C07D 211/70 (2006.01); C07D 277/08 (2006.01); C07D 263/02 (2006.01); C07D 263/30 (2006.01); C07D 233/00 (2006.01); C07D 207/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Ionic liquids having melting points below about 100 C formed by reaction of a heterocyclic amine with about 2.8 and about 3.2 moles of anhydrous hydrogen fluoride per mole of amine nitrogen. Electrochemical devices having non-aqueous electrolytes containing the ionic liquids are also disclosed, as well as silicon oxide etching compositions containing the ionic liquids and etching methods in which silicon oxides are selectively removed by the etching compositions in the presence of aluminum.


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