The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8148182 B1

PDF
Full Text
Expired
Date of Patent:
Apr. 03, 2012

Filed:

Mar. 05, 2010
Applicants:

Oh-nam Kwon, Chungcheongnam-do, KR;

Kyoung-mook Lee, Seoul, KR;

Heung-lyul Cho, Seoul, KR;

Seung-hee Nam, Dae-gu, KR;

Cyoo-chul JO, Gyeonggi-do, KR;

Inventors:

Oh-Nam Kwon, Chungcheongnam-do, KR;

Kyoung-Mook Lee, Seoul, KR;

Heung-Lyul Cho, Seoul, KR;

Seung-Hee Nam, Dae-gu, KR;

Cyoo-Chul Jo, Gyeonggi-do, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/84 (2006.01);
U.S. Cl.
CPC ...
Abstract

A manufacturing method of an electro line for a liquid crystal display device includes depositing a barrier layer made of a conducting material on a substrate, depositing a copper layer (Cu) on the barrier layer, wet-etching the Cu layer using a first etchant, and dry-etching the barrier layer using a second etchant using the wet-etched Cu layer as an etch mask.


Find Patent Forward Citations

Kwon, Oh-Nam. (2012). Manufacturing method of electro line for liquid crystal display device (U.S. Patent No. 8148182). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8148182

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…