The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 03, 2012
Filed:
Aug. 18, 2010
Applicants:
Motoshi Ono, Tokyo, JP;
Mitsuru Watanabe, Tokyo, JP;
Masabumi Ito, Tokyo, JP;
Inventors:
Assignee:
Asahi Glass Company, Limited, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/00 (2006.01); B23K 26/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
The present invention is to provide a method for smoothing the optical surface having a concave defect of an optical component for EUVL. The present invention relates to a method for smoothing the optical surface of an optical component for EUVL, comprising irradiating, with an excimer laser having a wavelength of 250 nm or less with a fluence of 0.5 to 2.0 J/cm, the optical surface having a concave defect of an optical component for EUV lithography (EUVL), the optical component being made of a TiO-containing silica glass material comprising SiOas a main component.