The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 03, 2012
Filed:
Sep. 23, 2005
Wei Chen, Midland, MI (US);
Brian Robert Harkness, Midland, MI (US);
Joan Sudbury-holtschlag, Auburn, MI (US);
Lenin James Petroff, Bay City, MI (US);
Wei Chen, Midland, MI (US);
Brian Robert Harkness, Midland, MI (US);
Joan Sudbury-Holtschlag, Auburn, MI (US);
Lenin James Petroff, Bay City, MI (US);
Dow Corning Corporation, Midland, MI (US);
Abstract
A lithography method includes the steps of: A) filling a mold having a patterned surface with a phase change composition at a temperature above the phase change temperature of the phase change composition; B) hardening the phase change composition to form a patterned feature; C) separating the mold and the patterned feature; optionally D) etching the patterned feature; optionally E) cleaning the mold; and optionally F) repeating steps A) to D) reusing the mold. The PCC may include an organofunctional silicone wax.