The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 27, 2012
Filed:
Jan. 26, 2006
Tomoyuki Miyashita, Utsunomiya, JP;
Tomoyuki Miyashita, Utsunomiya, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A method of determining a defocus direction of a pattern image formed on a reticle, which is projected by an exposure apparatus onto a resist on a substrate as a resist pattern, the exposure apparatus exposing the resist to light via the pattern image on the reticle to form the resist pattern. The method includes an image capturing step of capturing a resist image of the resist pattern that is formed on the substrate by the exposure apparatus, to obtain image data, an extracting step of extracting a feature of the image data to obtain feature data, and a determining step of determining the defocus direction of the pattern image based on the extracted feature data. The resist pattern includes a dual tone line end shortening target having a hollow grating mark and a solid grating mark, and the feature data includes an edge sharpness of a waveform of the image data.