The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 27, 2012

Filed:

Nov. 05, 2008
Applicants:

David L. Heald, Solvang, CA (US);

Karen Chu Cruden, Pleasanton, CA (US);

Xiangfeng Duan, Mountain View, CA (US);

Chao Liu, San Jose, CA (US);

J. Wallace Parce, Palo Alto, CA (US);

Inventors:

David L. Heald, Solvang, CA (US);

Karen Chu Cruden, Pleasanton, CA (US);

Xiangfeng Duan, Mountain View, CA (US);

Chao Liu, San Jose, CA (US);

J. Wallace Parce, Palo Alto, CA (US);

Assignee:

Nanosys, Inc., Palo Alto, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/06 (2006.01);
U.S. Cl.
CPC ...
Abstract

Methods for forming or patterning nanostructure arrays are provided. The methods involve formation of arrays on coatings comprising nanostructure association groups, patterning using resist, and/or use of devices that facilitate array formation. Related devices for forming nanostructure arrays are also provided, as are devices including nanostructure arrays (e.g., memory devices).


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