The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 27, 2012
Filed:
Jun. 03, 2009
Applicant:
Katsutoshi Kobayashi, Yokohama, JP;
Inventor:
Katsutoshi Kobayashi, Yokohama, JP;
Assignee:
Kabushiki Kaisha Toshiba, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/26 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for manufacturing a semiconductor device including: forming a resist filmon a film to be processed; baking the resist film; performing immersion exposure on the resist filmafter the baking; performing post exposure bake on the resist filmafter performing the immersion exposure; developing the resist filmafter performing the post exposure bake; and after the post exposure bake is performed on the resist film, removing an edgeof the resist film, the edge not being exposed.