The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 27, 2012
Filed:
Aug. 21, 2007
Reginald M. Penner, Newport Beach, CA (US);
Erik J. Menke, Merced, CA (US);
Michael A. Thompson, Menlo Park, CA (US);
Chengxiang Xiang, Irvine, CA (US);
Reginald M. Penner, Newport Beach, CA (US);
Erik J. Menke, Merced, CA (US);
Michael A. Thompson, Menlo Park, CA (US);
Chengxiang Xiang, Irvine, CA (US);
The Regents of the University of California, Oakland, CA (US);
Abstract
Lithographically patterned nanowire electrodeposition (LPNE) combines attributes of photolithography with the versatility of bottom-up electrochemical synthesis. Photolithography is employed to define the position of a sacrificial nanoband electrode, preferably formed from a metal such as nickel, copper, silver, gold or the like, which is stripped using electrooxidation or a chemical etchant to advantageously recess the nanoband electrode between a substrate surface and the photoresist to form a trench defined by the substrate surface, the photoresist and the nanoband electrode. The trench acts as a 'nanoform' to form an incipient nanowire during its electrodeposition. The width of the nanowire is determined by the electrodeposition duration while its height is determined by the height of the nanoband electrode.