The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 27, 2012
Filed:
Jul. 02, 2007
Applicants:
Hideki Kawai, Kobe, JP;
Yukitoshi Nakatsuji, Sakai, JP;
Hiroaki Sawada, Sakai, JP;
Shinichi Saeki, Sakai, JP;
Inventors:
Hideki Kawai, Kobe, JP;
Yukitoshi Nakatsuji, Sakai, JP;
Hiroaki Sawada, Sakai, JP;
Shinichi Saeki, Sakai, JP;
Assignee:
Konica Minolta Opto, Inc., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23G 1/00 (2006.01); C03C 3/085 (2006.01); C03C 3/095 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for fabricating a glass substrate containing SiOas a main ingredient thereof for an information recording medium which ensures removal of abrasive or foreign mater adhered to the glass substrate without complicating a cleaning step, involves, after a polishing step, keeping the surface of the glass substrate in contact with a liquid having a Si element elution in a range from 100 to 10 000 ppb/mmbefore a scrub-cleaning step.