The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 20, 2012
Filed:
Aug. 29, 2008
Anthony Correale, Jr., Raleigh, NC (US);
Benjamin J. Bowers, Cary, NC (US);
Matthew W. Baker, Holly Springs, NC (US);
Irfan Rashid, Cary, NC (US);
Paul M. Steinmetz, Holly Springs, NC (US);
Anthony Correale, Jr., Raleigh, NC (US);
Benjamin J. Bowers, Cary, NC (US);
Matthew W. Baker, Holly Springs, NC (US);
Irfan Rashid, Cary, NC (US);
Paul M. Steinmetz, Holly Springs, NC (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Embodiments that make DFM alterations to cells of 1×N building blocks via a closed-loop 1×N compiler are disclosed. Some embodiments comprise using a 1×N compiler to detect a relationship between two adjacent cells of a 1×N building block. Based on the relationship, the embodiments select a DFM alteration and apply the alteration to a physical design representation. The embodiments may apply various types of DFM alterations depending on the relationship, such as adding polysilicon, adding metal to create redundant connections, and merging diffusion areas to increase capacitance on supply nodes. Further embodiments comprise an apparatus having a cell examiner to examine two adjacent cells of a 1×N building block and determine a relationship of the two cells. The apparatus also comprises a DFM selector to select a DFM alteration based on the relationship and a DFM applicator to apply the selected DFM alteration to one of the cells.